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- May 27, 2016
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OK - decoding what is going on with the "pulsed" plating. Stop the video at the places where you get a view of the power supply display readings. e.g. at 6:57. See that at the time it was running 2.88 amps, and had been casually set to approximately 9 volts, and that it had delivered 2.55 Ampere-Hours worth of electrons. There is no sign of where it gets it's "pulsed" capability from.So, it absolutely is possible to do what you are suggesting. It appears that the rectifier control is the trick and the rest is plumbing, chemistry, tooling and setup.
This feels like it is absolutely in the wheelhouse of hobbyists from my point of view. Now to find a rectifier...
Now - extracted from another paper, I find the following text..
Electro nickel plating involves a wide range of current density levels. Current density directly determines the deposition rate of nickel to the base material—specifically, the higher the current density, the quicker the deposition rate. Current density, however, also affects plating adherence and plating quality, with higher current density levels delivering poorer results. Therefore, the optimal level of current density depends on the type of base material and specific type of results the final product requires.
One way to avoid working at lower current densities is by employing a discontinuous direct current to the electroplating solution. By allowing between one and three seconds of break time between every eight to fifteen seconds of electrical current, high current densities can produce a higher level of quality. A discontinuous current is also beneficial for avoiding over-plating of specific sections on the base material.
So the answer is , if you have the patience to put up with a longer plating time, the lower current density (without pulsing) will deliver a highly adherent coating. Short bursts of higher density can make a thicker coating, faster, and with stress, adhesion, and hardness qualities that depend on all the bath parameters, and the pulsed duty cycle.
In the text, they describe pulse cycle periods of 8 seconds to 15 seconds, with ON time between 1 second and 3 seconds. If I were trying it, I might try pulse cycles as short as 0.5 seconds period.
20 whole seconds seems a big maximum, but we go with it for now.
The actual current you hit it with should likely not be more than you might allow when going for the faster, if poorer, quality deposition, on a non-pulsed supply.
[Edit: Hmm.. it turns out to be more complicated than that. Even though the use of current pulses in the plating process is used, it might be essentially an electro-less process. The current pulse and duty cycle is too low to be the main delivery of deposited metal. The effect of the pulse every few seconds is to re-start an electro-less process which has slowed down - a normal characteristic. Pat US3,264,199 (1966)]
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